Ablation plasma ion implantation experiments: Measurement of Fe implantation into Si
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چکیده
منابع مشابه
Ablation plasma ion implantation experiments: Measurement of Fe implantation into Si
Experiments have been performed demonstrating the feasibility of direct implantation of laser-ablated metal ions into a substrate. Initial experiments implanted iron ions into silicon substrates at pulsed, bias voltages up to negative 10 kV. Implantation of Fe ions into Si was confirmed by cross-sectional transmission electron microscopy and x-ray photoelectron spectroscopy. The 7.6 nm depth of...
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ژورنال
عنوان ژورنال: Applied Physics Letters
سال: 2001
ISSN: 0003-6951,1077-3118
DOI: 10.1063/1.1379360